Library
home (Home) TU Delft Repository login Login

Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications

Journal Article (2016)
Author(s)

E. Serra (Trento Institute for Fundamental Physics and Applications, TU Delft - Electronic Components, Technology and Materials)

M. Bawaj (Istituto Nazionale di Fisica Nucleare - Sezione di Perugia, University of Camerino)

A. Borrielli (Trento Institute for Fundamental Physics and Applications, Institute of Materials for Electronics and Magnetism - Nanoscience-Trento-FBK Division)

G. Di Giuseppe (Istituto Nazionale di Fisica Nucleare - Sezione di Perugia, University of Camerino)

S. Forte (TU Delft - EKL Processing, Università degli Studi di Trento)

N. Kralj (University of Camerino)

N. Malossi (University of Camerino, Istituto Nazionale di Fisica Nucleare - Sezione di Perugia)

L. Marconi (Istituto Nazionale di Ottica, Consiglio Nazionale delle Ricerche, University of Florence, Istituto Nazionale di Fisica Nucleare - Sezione di Firenze)

F. Marin (University of Florence, European Laboratory for Non-linear Spectroscopy (LENS), Istituto Nazionale di Fisica Nucleare - Sezione di Firenze)

F. Marino (Istituto Nazionale di Fisica Nucleare - Sezione di Firenze, Istituto Nazionale di Ottica, Consiglio Nazionale delle Ricerche)

B. Morana (TU Delft - EKL-Users)

R. Natali (University of Camerino, Istituto Nazionale di Fisica Nucleare - Sezione di Perugia)

G. Pandraud (TU Delft - EKL Processing)

A. Pontin (Istituto Nazionale di Fisica Nucleare - Sezione di Firenze, University of Florence)

G.A. Prodi (Università degli Studi di Trento, Trento Institute for Fundamental Physics and Applications)

M. Rossi (University of Camerino)

P.M. Sarro (TU Delft - Electronic Components, Technology and Materials)

D. Vitali (Istituto Nazionale di Fisica Nucleare - Sezione di Perugia, University of Camerino)

M. Bonaldi (Institute of Materials for Electronics and Magnetism - Nanoscience-Trento-FBK Division, Trento Institute for Fundamental Physics and Applications)

Research Group
Electronic Components, Technology and Materials
DOI related publication
https://doi.org/10.1063/1.4953805
More Info
expand_more
Publication Year
2016
Language
English
Research Group
Electronic Components, Technology and Materials
Journal title
AIP Advances
Volume number
6
Article number
065004
Pages (from-to)
065004-1/065004-8
Downloads counter
393
Collections
Institutional Repository
Reuse Rights

Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.

Abstract

In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michelson interferometer, where Q values up to 1.3 × 106 were measured at cryogenic temperatures, and in a Fabry-Pérot cavity, where an optical finesse up to 50000 has been observed.