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Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications

Journal Article (2016)
Author(s)

E. Serra (Trento Institute for Fundamental Physics and Applications, TU Delft - Electrical Engineering, Mathematics and Computer Science)

M. Bawaj (Istituto Nazionale di Fisica Nucleare - Sezione di Perugia, University of Camerino)

A. Borrielli (Trento Institute for Fundamental Physics and Applications, Institute of Materials for Electronics and Magnetism - Nanoscience-Trento-FBK Division)

G. Di Giuseppe (Istituto Nazionale di Fisica Nucleare - Sezione di Perugia, University of Camerino)

S. Forte (TU Delft - Electrical Engineering, Mathematics and Computer Science, Università degli Studi di Trento)

N. Kralj (University of Camerino)

N. Malossi (University of Camerino, Istituto Nazionale di Fisica Nucleare - Sezione di Perugia)

L. Marconi (Istituto Nazionale di Ottica, Consiglio Nazionale delle Ricerche, University of Florence, Istituto Nazionale di Fisica Nucleare - Sezione di Firenze)

F. Marin (University of Florence, European Laboratory for Non-linear Spectroscopy (LENS), Istituto Nazionale di Fisica Nucleare - Sezione di Firenze)

F. Marino (Istituto Nazionale di Fisica Nucleare - Sezione di Firenze, Istituto Nazionale di Ottica, Consiglio Nazionale delle Ricerche)

B. Morana (TU Delft - Electrical Engineering, Mathematics and Computer Science)

R. Natali (University of Camerino, Istituto Nazionale di Fisica Nucleare - Sezione di Perugia)

G. Pandraud (TU Delft - Electrical Engineering, Mathematics and Computer Science)

A. Pontin (Istituto Nazionale di Fisica Nucleare - Sezione di Firenze, University of Florence)

G.A. Prodi (Università degli Studi di Trento, Trento Institute for Fundamental Physics and Applications)

M. Rossi (University of Camerino)

P.M. Sarro (TU Delft - Electrical Engineering, Mathematics and Computer Science)

D. Vitali (Istituto Nazionale di Fisica Nucleare - Sezione di Perugia, University of Camerino)

M. Bonaldi (Institute of Materials for Electronics and Magnetism - Nanoscience-Trento-FBK Division, Trento Institute for Fundamental Physics and Applications)

Research Group
Electronic Components, Technology and Materials
DOI related publication
https://doi.org/10.1063/1.4953805 Final published version
More Info
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Publication Year
2016
Language
English
Research Group
Electronic Components, Technology and Materials
Journal title
AIP Advances
Volume number
6
Article number
065004
Pages (from-to)
065004-1/065004-8
Downloads counter
426
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Institutional Repository
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Abstract

In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michelson interferometer, where Q values up to 1.3 × 106 were measured at cryogenic temperatures, and in a Fabry-Pérot cavity, where an optical finesse up to 50000 has been observed.