SF
S. Forte
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1
Journal article
(2016)
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E. Serra, M. Bawaj, B. Morana, R. Natali, G. Pandraud, A. Pontin, G.A. Prodi, M. Rossi, P.M. Sarro, D. Vitali, M. Bonaldi, A. Borrielli, G. Di Giuseppe, S. Forte, N. Kralj, N. Malossi, L. Marconi, F. Marin, F. Marino
In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michelson interferometer, where Q values up to 1.3 × 106 were measured at cryogenic temperatures, and in a Fabry-Pérot cavity, where an optical finesse up to 50000 has been observed.
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In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michelson interferometer, where Q values up to 1.3 × 106 were measured at cryogenic temperatures, and in a Fabry-Pérot cavity, where an optical finesse up to 50000 has been observed.