Triode-Sputtered High-Tc Superconducting Thin Films

Journal Article (1988)
Author(s)

B. Dam (Philips Research Laboratories)

H. A.M. Van Hal (Philips Research Laboratories)

C. Langereis (Philips Research Laboratories)

Affiliation
External organisation
DOI related publication
https://doi.org/10.1209/0295-5075/5/5/013
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Publication Year
1988
Language
English
Affiliation
External organisation
Issue number
5
Volume number
5
Pages (from-to)
455-460

Abstract

High-Tc superconducting thin films were prepared by DC sputtering. Contrary to diode sputter methods, in the triode configuration applied here no compositional adjustment of the ceramic YBa2Cu3Ox target appeared necessary. SrTiO3 (100) was the best substrate found so far. After an onset at Tco = 92 K, we found a complete superconductive transition at Tcf = 86 K. At the transition a five-order decrease in resistivity could be measured. On other substrates such as Al2O3, MgO and ZrO2 relatively poor results were obtained. Characterization was performed by SEM, x-ray diffraction and Rutherford backscattering (RBS).

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