High-dose exposure of silicon in electron beam lithography
Journal Article
(2008)
Author(s)
AE Grigorescu (TU Delft - ImPhys/Charged Particle Optics)
M.C. van der Krogt (TU Delft - QN/Kavli Nanolab Delft)
Emile van der Drift (TU Delft - QN/Kavli Nanolab Delft)
C. W. Hagen (TU Delft - ImPhys/Charged Particle Optics)
Research Group
ImPhys/Charged Particle Optics
To reference this document use:
https://resolver.tudelft.nl/uuid:4a81795c-dd3c-4f8b-947e-c8841631f064
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Publication Year
2008
Research Group
ImPhys/Charged Particle Optics
Issue number
1
Volume number
7
Pages (from-to)
013005-1-013005-4
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