High-dose exposure of silicon in electron beam lithography

Journal article (2008)

Authors

AE Grigorescu ImPhys/Charged Particle Optics
M.C. van der Krogt QN/Kavli Nanolab Delft - AS
E.W.J.M. van der Drift QN/Kavli Nanolab Delft - AS
C.W. Hagen ImPhys/Charged Particle Optics
Research Group
ImPhys/Charged Particle Optics
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Published Date

2008

Language

Undefined/Unknown

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Research Group

ImPhys/Charged Particle Optics