Some recent developments in chemical vapor deposition process and equipment modelling.
Journal Article
(1999)
Author(s)
Chris R. Kleijn (TU Delft - Old - sect Kramers Laboratory (MSP/FT))
KJ Kuijlaars (TU Delft - Old - sect Kramers Laboratory (MSP/FT))
M Okkerse-Ruitenberg (TU Delft - Old - sect Kramers Laboratory (MSP/FT))
H van Santen (TU Delft - Old - sect Kramers Laboratory (MSP/FT))
Harry E.A. Van den Akker (TU Delft - Old - sect Kramers Laboratory (MSP/FT))
Research Group
Old - sect Kramers Laboratory (MSP/FT)
To reference this document use:
https://resolver.tudelft.nl/uuid:4b6acd38-bc92-4f48-ba82-ae1ad53fde34
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Publication Year
1999
Research Group
Old - sect Kramers Laboratory (MSP/FT)
Issue number
Pr8
Volume number
9
Pages (from-to)
117-132
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