System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission

Patent (2010)

Contributors

S. Steenbrink External organisation (inventor)
P. Kruit ImPhys/Charged Particle Optics (inventor)
Research Group
ImPhys/Charged Particle Optics
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Published Date

2010

Language

English

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Research Group

ImPhys/Charged Particle Optics