Influence of the development process on ultimate resolution electron beam lithography using ultrathin hydrogen silsesquioxane resist layers

Grigorescu, AE; Van Der Krogt, M.C.; Hagen, Cornelis W.; Kruit, P

Influence of the development process on ultimate resolution electron beam lithography using ultrathin hydrogen silsesquioxane resist layers

Journal article (2007)

Authors

AE Grigorescu ImPhys/Charged Particle Optics

M.C. Van Der Krogt QN/Kavli Nanolab Delft

Cornelis W. Hagen ImPhys/Charged Particle Optics

P Kruit ImPhys/Charged Particle Optics

Research Group

ImPhys/Charged Particle Optics

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Published Date

2007

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Research Group

ImPhys/Charged Particle Optics

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