Influence of the development process on ultimate resolution electron beam lithography using ultrathin hydrogen silsesquioxane resist layers

Journal article (2007)

Authors

AE Grigorescu ImPhys/Charged Particle Optics
M.C. van der Krogt QN/Kavli Nanolab Delft - AS
C.W. Hagen ImPhys/Charged Particle Optics
P. Kruit ImPhys/Charged Particle Optics
Research Group
ImPhys/Charged Particle Optics
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Published Date

2007

Language

Undefined/Unknown

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Research Group

ImPhys/Charged Particle Optics