Influence of the development process on ultimate resolution electron beam lithography using ultrathin hydrogen silsesquioxane resist layers
Journal Article
(2007)
Author(s)
AE Grigorescu (TU Delft - ImPhys/Charged Particle Optics)
MC Van Der Krogt (TU Delft - QN/Kavli Nanolab Delft)
CW Hagen (TU Delft - ImPhys/Charged Particle Optics)
P Kruit (TU Delft - ImPhys/Charged Particle Optics)
Research Group
ImPhys/Charged Particle Optics
To reference this document use:
https://resolver.tudelft.nl/uuid:4e6c5064-a750-402b-a4ad-6e5ebc405e90
More Info
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Publication Year
2007
Research Group
ImPhys/Charged Particle Optics
Issue number
6
Volume number
25
Pages (from-to)
1998-2003
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