Moly-poly solar cell

Industrial application of metal-oxide passivating contacts with a starting efficiency of 18.1%

Conference Paper (2018)
Author(s)

Pierpaolo Spinelli (ECN Solar Energy)

Mike Ah Sen (ECN Solar Energy)

Eelko G. Hoek (ECN Solar Energy)

Benjamin W.J. Kikkert (ECN Solar Energy)

Guangtao Yang (TU Delft - Photovoltaic Materials and Devices)

Olindo Isabella (TU Delft - Photovoltaic Materials and Devices)

Arthur W. Weeber (TU Delft - Photovoltaic Materials and Devices, ECN Solar Energy)

Paula C.P. Bronsveld (ECN Solar Energy)

DOI related publication
https://doi.org/10.1063/1.5049284 Final published version
More Info
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Publication Year
2018
Language
English
Volume number
1999
Article number
040021
ISBN (print)
978-073541715-1
Event
Downloads counter
222

Abstract

We present large-area "moly-poly" cells, with a front side MoOx/a-Si:H(i) passivating contact and a rear-side poly-Si/SiOx stack, and we have demonstrated that MoOx based c-Si solar cell technology can be scaled to industrial wafer size. Excellent surface passivation was achieved using MoOx and poly-Si, leading to implied Voc values above 700 mV, and a final cell Voc of 687 mV. However, some care needs to be taken to avoid parasitic optical losses in the infra-red (IR) spectral range due to free-carrier absorption (FCA). These losses were investigated by comparing poly-Si layers of different thicknesses, deposited by low-pressure or plasma-enhanced chemical vapor deposition (LPCVD or PECVD), at the rear side of moly-poly cells. We found that ultra-thin PECVD layers are most suitable for solar cell applications due to a very good trade-off between surface passivation and reduced FCA. Based on this result, a 18.1% efficient 9.2 × 9.2 cm2 moly-poly cell was made, which is the highest reported efficiency so far for moly-poly cells. Finally, we present a preliminary study of the parasitic IR losses in the MoOx layer itself, when deposited on either a-Si:H or SiOx passivation layers.