Diffusion of Ge in Si1-xGex/Si single quantum wells in inert and oxidizing ambients
Journal Article
(2000)
Author(s)
M Griglione (External organisation)
TJ Anderson (External organisation)
YM Haddara (External organisation)
ME Law (External organisation)
KS Jones (External organisation)
A. van Bogaard (TU Delft - Electronic Components, Technology and Materials)
Research Group
Electronic Components, Technology and Materials
To reference this document use:
https://resolver.tudelft.nl/uuid:52f701e2-fb0e-458c-b730-4cc431851da9
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Publication Year
2000
Research Group
Electronic Components, Technology and Materials
Issue number
3
Volume number
88
Pages (from-to)
1366-1372
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