Electrical Characterization of Residual Implantation-Induced Defects in the Vicinity of Laser-Annealed Implanted Ultrashallow Junctions in Doping Engineering for Device Fabrication
Conference Paper
(2006)
Author(s)
V Gonda (TU Delft - Electronic Components, Technology and Materials)
Shizhuo Liu (External organisation)
T.L.M. Scholtes (TU Delft - Electronic Components, Technology and Materials)
L.K. Nanver (TU Delft - Electronic Components, Technology and Materials)
Research Group
Electronic Components, Technology and Materials
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https://resolver.tudelft.nl/uuid:58f1d331-8dc5-4362-90a0-cac652280881
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Publication Year
2006
Research Group
Electronic Components, Technology and Materials
Pages (from-to)
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