Balancing the etching and passivation in time-multiplexed deep dry etching of silicon.
Journal Article
(2001)
Authors
MA Blauw (TU Delft - QN/Kavli Nanolab Delft)
T Zijlstra (TU Delft - QN/Kavli Nanolab Delft)
EWJM van der Drift (TU Delft - QN/Kavli Nanolab Delft)
Research Group
QN/Kavli Nanolab Delft
To reference this document use:
https://resolver.tudelft.nl/5b3ac138-a99c-41b5-b715-819e44dcb07e
More Info
expand_more
expand_more
Publication Year
2001
Research Group
QN/Kavli Nanolab Delft
Issue number
6
Volume number
19
Pages (from-to)
2930-2934
No files available
Metadata only record. There are no files for this record.