Impact of Interface Charge on the Electrostatics of Field-Plate Assisted RESURF Devices

Journal Article (2014)
Author(s)

Boni K. Boksteen (University of Twente)

Alessandro Ferrara (University of Twente)

Anco Heringa (NXP Semiconductors)

Peter Steeneken (NXP Semiconductors, TU Delft - Applied Sciences)

Raymond J.E. Hueting (University of Twente)

Research Group
QN/Steeneken Lab
DOI related publication
https://doi.org/10.1109/TED.2014.2327574 Final published version
More Info
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Publication Year
2014
Language
English
Research Group
QN/Steeneken Lab
Issue number
8
Volume number
61
Pages (from-to)
2859-2866
Downloads counter
175

Abstract

A systematic study on the effects of arbitrary parasitic charge profiles, such as trapped or fixed charge, on the 2-D potential distribution in the drain extension of reverse-biased field-plate-assisted reduced surface field (RESURF) devices is presented. Using TCAD device simulations and analytical means, the significance of the so-called characteristic or natural length λ is highlighted with respect to the potential distribution and related phenomena in both ideal (virgin) and nonideal (degraded) extensions. Subsequently, a novel and easy-to-use charge-response method is introduced that enables calculation of the potential distribution for an arbitrary parasitic charge profile once the peak potential and lateral fall-off (∝λ) caused by a single unit charge has been determined. This can be used for optimizing and predicting the performance, also after hot carrier injection, of RESURF power devices.