Stochastic coulomb interactions in ion projection lithography systems with aberration-broadened crossover
Journal Article
(1997)
Author(s)
P. Kruit (TU Delft - ImPhys/Charged Particle Optics)
JE Barth (TU Delft - ImPhys/Charged Particle Optics)
G Lammer (External organisation)
A Chalupka (External organisation)
H Vonach (External organisation)
H Löschner (External organisation)
G Stengl (External organisation)
Research Group
ImPhys/Charged Particle Optics
To reference this document use:
https://resolver.tudelft.nl/uuid:63167e20-0cd3-4806-ac43-cf4222a63990
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Publication Year
1997
Research Group
ImPhys/Charged Particle Optics
Issue number
6
Volume number
15
Pages (from-to)
2369-2372
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