Stochastic coulomb interactions in ion projection lithography systems with aberration-broadened crossover

Journal article (1997)

Authors

P. Kruit ImPhys/Charged Particle Optics
JE Barth ImPhys/Charged Particle Optics
G Lammer External organisation
A Chalupka External organisation
H Vonach External organisation
H Löschner External organisation
G Stengl External organisation
Research Group
ImPhys/Charged Particle Optics
More Info
expand_more

Published Date

1997

Language

Undefined/Unknown

Reuse Rights

Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.

Research Group

ImPhys/Charged Particle Optics