Optimization of a plasma etching machine for failure analysis of semiconductors
B. Xu (TU Delft - Electrical Engineering, Mathematics and Computer Science)
Guo Qi Zhang – Mentor (TU Delft - Electronic Components, Technology and Materials)
K.M. Dowling – Graduation committee member (TU Delft - Electronic Instrumentation)
Jiaqi Tang – Coach (Jiaco Instruments)
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Abstract
Microwave Induced Plasma (MIP) is an advanced decapsulation tool developed by Jiaco Instruments. The goal of this thesis is to optimise the current MIP system. There are two directions: 1. Improve the etching rate. 2. Find selectivity between different materials (Si, SiO2, SiN). The experiments are divided into two parts in total, improved cavity and CF4-based MIP machine etching selectivity experiment. The cavity experimental results demonstrate that high input power is the route to optimising MIP efficiency. Etch experiments demonstrate that the CF4/O2 gas recipe is effective in achieving etch selectivity and that temperature is a key factor influencing these etch selectivities.
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