XPS surface characterization of a Cu/SiO<sub>2</sub> catalyst oxidized by NO or O<sub>2</sub>

Journal article (1993)

Authors

R. Balkenende Universiteit Utrecht
W.E.J. van Kooten Universiteit Utrecht
A.R. Pieters Universiteit Utrecht
M Lamers Universiteit Utrecht
F.J.J.G. Janssen N.V. KEMA
JW Geus Universiteit Utrecht
Affiliation
External organisation
More Info
expand_more

Published Date

1993-7

Language

English

Reuse Rights

Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.

Affiliation

External organisation

Abstract

The oxidation of a Cu/SiO2 catalyst with NO or O2 at temperatures varying from 313 to 513 K has been investigated using XPS. Upon admission of NO or O2 to a previously reduced catalyst, a rapid transformation of Cu(0) to Cu(I) is observed. This first stage is followed by slow oxidation of Cu(I) to Cu(II). After exposure to NO the presence of a surface nitride at the catalyst surface is evident. Exposure at low temperatures also leads to the formation of nitrito and nitrato like surface species. These species decompose at 523 K. Desorption of the surface nitride is observed after heating the catalyst at 723 K. The XPS measurements performed on the supported catalyst are in good agreement with experimental data obtained on single crystals.