Influence of SiH2Cl2 on the kinetics of chemical vapor deposition of tungsten by SiH4 reduction of WF6.
Journal Article
(1999)
Author(s)
JF Jongste (External organisation)
TGM Oosterlaken (External organisation)
GCAM Janssen (TU Delft - OLD Metals Processing, Microstructures and Properties)
S Radelaar (TU Delft - OLD Metals Processing, Microstructures and Properties)
Research Group
OLD Metals Processing, Microstructures and Properties
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Publication Year
1999
Research Group
OLD Metals Processing, Microstructures and Properties
Volume number
146
Pages (from-to)
167-169
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