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TO
TGM Oosterlaken
10 records found
1
Authored
Simulation and validation of SiO2 LPCVD from TEOS in a vertical 300 mm multi-wafer reactor
Journal article (2002) -
GJ Schoof
,
C.R. Kleijn
,
H.E.A. van den Akker
,
TGM Oosterlaken
,
H.J.M.C. Terhorst
,
F. Huussen
Simulation of SiO2 deposition in a vertical 300 mm LPCVD furnace
Conference paper (2002) -
GJ Schoof
,
C.R. Kleijn
,
TGM Oosterlaken
,
F. Huussen
,
H.J.M.C. Terhorst
Influence of SiH2Cl2 on the kinetics of chemical vapor deposition of tungsten by SiH4 reduction of WF6.
Journal article (1999) -
JF Jongste
,
TGM Oosterlaken
,
G.C.A.M. Janssen
,
S Radelaar
Final Report on the materials properties of W and WSI2 produced with the WF6/Poly-Si Displacement reaction
Report (1997) -
C Schaffnit
,
E Sabouret
,
CA van de Jeugd
,
TGM Oosterlaken
,
G.C.A.M. Janssen
,
S Radelaar
In situ characterisation of CVD processes by Raman Scattering: Determination of the kinetics of the hydrogen reduction of WF6
Doctoral thesis (1996) -
TGM Oosterlaken
The kinetics of tungsten deposition from a H2/WF6 mixture studied by in situ laser Raman scattering
Conference paper (1996) -
TGM Oosterlaken
,
GJ Leusink
,
G.C.A.M. Janssen
,
S Radelaar
The hydrogen reduction of WF6: A kinetic study based on in situ partial pressure measurements
Journal article (1996) -
TGM Oosterlaken
,
GJ Leusink
,
G.C.A.M. Janssen
,
S Radelaar
Properties of tungsten point contacts formed with chemical vapour deposition
Journal article (1996) -
NN Gribov
,
J. Caro-Schuurman
,
TGM Oosterlaken
,
S Radelaar
Modeling of blanket and selective tungsten LPCVD
Conference paper (1996) -
KJ Kuijlaars
,
C.R. Kleijn
,
H.E.A. van den Akker
,
TGM Oosterlaken
,
G.C.A.M. Janssen
The kinetics of tungsten deposition from the H2/WF6 mixture studied by in situ laser Raman scattering
Conference paper (1996) -
TGM Oosterlaken
,
GJ Leusink
,
G.C.A.M. Janssen
,
S Radelaar
