Simulation and validation of SiO2 LPCVD from TEOS in a vertical 300 mm multi-wafer reactor
Journal Article
(2002)
Author(s)
GJ Schoof (TU Delft - Old - sect Kramers Laboratory (MSP/FT))
Chris R. Kleijn (TU Delft - Old - sect Kramers Laboratory (MSP/FT))
Harry EA Van den Akker (TU Delft - Old - sect Kramers Laboratory (MSP/FT))
TGM Oosterlaken (External organisation)
H.J.M.C. Terhorst (External organisation)
F. Huussen (External organisation)
Research Group
Old - sect Kramers Laboratory (MSP/FT)
To reference this document use:
https://resolver.tudelft.nl/uuid:ef300bad-cd83-4b75-9276-dfe18286e2e9
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Publication Year
2002
Research Group
Old - sect Kramers Laboratory (MSP/FT)
Issue number
Pr4
Volume number
12
Pages (from-to)
51-61
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