Simulation of SiO2 deposition in a vertical 300 mm LPCVD furnace
Conference Paper
(2002)
Author(s)
GJ Schoof (TU Delft - Old - sect Kramers Laboratory (MSP/FT))
C. R. Kleijn (TU Delft - Old - sect Kramers Laboratory (MSP/FT))
TGM Oosterlaken (External organisation)
F. Huussen (External organisation)
H.J.M.C. Terhorst (External organisation)
Research Group
Old - sect Kramers Laboratory (MSP/FT)
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Publication Year
2002
Research Group
Old - sect Kramers Laboratory (MSP/FT)
Pages (from-to)
101-112
ISBN (print)
0-7918-4659-8
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