Simulation of SiO2 deposition in a vertical 300 mm LPCVD furnace

Conference paper (2002)

Authors

GJ Schoof Old - sect Kramers Laboratory (MSP/FT)
C.R. Kleijn Old - sect Kramers Laboratory (MSP/FT)
TGM Oosterlaken External organisation
F. Huussen External organisation
H.J.M.C. Terhorst External organisation
Research Group
Old - sect Kramers Laboratory (MSP/FT)
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Published Date

2002

Language

Undefined/Unknown

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Research Group

Old - sect Kramers Laboratory (MSP/FT)