Isothermal stress relaxation in Al, AlCu and AlVPd films
Conference Paper
(1996)
Author(s)
JP Lokker (TU Delft - QN/Fysics of NanoElectronics)
JF Jongste (External organisation)
GCAM Janssen (TU Delft - OLD Metals Processing, Microstructures and Properties)
S Radelaar (TU Delft - OLD Metals Processing, Microstructures and Properties)
Research Group
QN/Fysics of NanoElectronics
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https://resolver.tudelft.nl/uuid:6c4d4752-8678-4a67-9c63-62bcda0e3123
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Publication Year
1996
Research Group
QN/Fysics of NanoElectronics
Pages (from-to)
513-516
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