Systematic and Accurate Method to Model Dielectric Stratifications in Artificial Dielectric Layers
Roderick G. Tapia Barroso (TU Delft - Tera-Hertz Sensing)
Daniele Cavallo (TU Delft - Tera-Hertz Sensing)
More Info
expand_more
Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.
Abstract
We present a systematic approach to include the effects of dielectric slabs in artificial dielectric layers (ADLs). Typical implementations of ADLs consist of layers of sub-wavelength metal patches supported by either dielectric slabs or thin dielectric films bonded onto foam spacers. The presence of dielectrics in the proximity of the metal layers affects the equivalent layer capacitance and thus must be accurately taken into account for the modeling and design of the ADLs. The proposed procedure allows to derive an analytical expression for the effective permittivity of each capacitive layer that depends on the dielectric layers in the vicinity of the metal. The equivalent layer capacitance can be then included in the ADL equivalent transmission line model, which can be used, for instance, for the design of matching structures in ultra-wideband arrays.