Kinetics and Crystal orientation dependence in High Aspect Ratio Silicon Dry Etching.

Journal article (2000)

Authors

MA Blauw QN/Kavli Nanolab Delft - AS
T Zijlstra QN/Kavli Nanolab Delft - AS
RA Bakker Old - sect Kramers Laboratory (MSP/FT)
E.W.J.M. van der Drift QN/Kavli Nanolab Delft - AS
Research Group
QN/Kavli Nanolab Delft (AS) (TU Delft)
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Published Date

2000

Language

Undefined/Unknown

Reuse Rights

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Faculty

Applied Sciences

Department

QN/Quantum Nanoscience

Research Group

QN/Kavli Nanolab Delft