Kinetics and Crystal orientation dependence in High Aspect Ratio Silicon Dry Etching.
Journal Article
(2000)
Author(s)
MA Blauw (TU Delft - QN/Kavli Nanolab Delft)
T Zijlstra (TU Delft - QN/Kavli Nanolab Delft)
RA Bakker (TU Delft - Old - sect Kramers Laboratory (MSP/FT))
EWJM van der Drift (TU Delft - QN/Kavli Nanolab Delft)
Research Group
QN/Kavli Nanolab Delft
To reference this document use:
https://resolver.tudelft.nl/uuid:76d4bc1e-8edf-44dd-a8fe-ff8cd891a612
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Publication Year
2000
Research Group
QN/Kavli Nanolab Delft
Issue number
6
Volume number
18
Pages (from-to)
3453-3461
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