Aspect ratio and crystallographic orientation dependence in deep dry silicon etching at cryogenic temperatures

Conference paper (2001)

Authors

G Cracium External organisation
MA Blauw QN/Kavli Nanolab Delft - AS
E.W.J.M. van der Drift QN/Kavli Nanolab Delft - AS
P.J. French Electronic Instrumentation - EEMCS
Research Group
QN/Kavli Nanolab Delft (AS) (TU Delft)
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Published Date

2001

Language

Undefined/Unknown

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Faculty

Applied Sciences

Department

QN/Quantum Nanoscience

Research Group

QN/Kavli Nanolab Delft