Aspect ratio and crystallographic orientation dependence in deep dry silicon etching at cryogenic temperatures
Conference Paper
(2001)
Author(s)
G Cracium (External organisation)
MA Blauw (TU Delft - QN/Kavli Nanolab Delft)
EWJM van der Drift (TU Delft - QN/Kavli Nanolab Delft)
P. J. French (TU Delft - Electronic Instrumentation)
Research Group
QN/Kavli Nanolab Delft
To reference this document use:
https://resolver.tudelft.nl/uuid:772cd7ab-5b42-4df2-bd82-8129bd5d84fc
More Info
expand_more
expand_more
Publication Year
2001
Research Group
QN/Kavli Nanolab Delft
Pages (from-to)
612-615
ISBN (print)
3-540-42150-5
No files available
Metadata only record. There are no files for this record.