Tolerating Retention Failures in Neuromorphic Fabric based on Emerging Resistive Memories

Conference Paper (2020)
Author(s)

Christopher Münch (Karlsruhe Institut für Technologie)

Rajendra Bishnoi (TU Delft - Computer Engineering)

MB Tahoori (Karlsruhe Institut für Technologie)

Research Group
Computer Engineering
DOI related publication
https://doi.org/10.1109/ASP-DAC47756.2020.9045339
More Info
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Publication Year
2020
Language
English
Research Group
Computer Engineering
Pages (from-to)
393-400
ISBN (print)
978-1-7281-4124-4
ISBN (electronic)
978-1-7281-4123-7

Abstract

In recent years, computation is shifting from conventional high performance servers to Internet of Things (IoT) edge devices, most of which require the processing of cognitive tasks. Hence, a great effort is put in the realization of neural network (NN) edge devices and their efficiency in inferring a pretrained Neural Network. In this paper, we evaluate the retention issues of emerging resistive memories used as non-volatile weight storage for embedded NN. We exploit the asymmetric retention behavior of Spintronic based Magnetic Tunneling Junctions (MTJs), which is also present in other resistive memories like Phase-Change memory (PCM) and ReRAM, to optimize the retention of the NN accuracy over time. We propose mixed retention cell arrays and an adapted training scheme to achieve a trade-off between array size and the reliable long-term accuracy of NNs. The results of our proposed method save up to 24% of inference accuracy of an MNIST trained Multi-Layer-Perceptron on MTJ-based crossbars.

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