Tolerating Retention Failures in Neuromorphic Fabric based on Emerging Resistive Memories

Conference Paper (2020)
Author(s)

Christopher Münch (Karlsruhe Institut für Technologie)

Rajendra Bishnoi (TU Delft - Computer Engineering)

Mehdi B. Tahoori (Karlsruhe Institut für Technologie)

DOI related publication
https://doi.org/10.1109/ASP-DAC47756.2020.9045339 Final published version
More Info
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Publication Year
2020
Language
English
Article number
9045339
Pages (from-to)
393-400
ISBN (print)
978-1-7281-4124-4
ISBN (electronic)
978-1-7281-4123-7
Event
2020 25th Asia and South Pacific Design Automation Conference (ASP-DAC) (2020-01-13 - 2020-01-16), Beijing, China
Downloads counter
148

Abstract

In recent years, computation is shifting from conventional high performance servers to Internet of Things (IoT) edge devices, most of which require the processing of cognitive tasks. Hence, a great effort is put in the realization of neural network (NN) edge devices and their efficiency in inferring a pretrained Neural Network. In this paper, we evaluate the retention issues of emerging resistive memories used as non-volatile weight storage for embedded NN. We exploit the asymmetric retention behavior of Spintronic based Magnetic Tunneling Junctions (MTJs), which is also present in other resistive memories like Phase-Change memory (PCM) and ReRAM, to optimize the retention of the NN accuracy over time. We propose mixed retention cell arrays and an adapted training scheme to achieve a trade-off between array size and the reliable long-term accuracy of NNs. The results of our proposed method save up to 24% of inference accuracy of an MNIST trained Multi-Layer-Perceptron on MTJ-based crossbars.