Plasma-enhanced chemical vapor deposition of thick silicon nitride films with low stress on inP.

Journal article (1996)

Authors

L Shi External organisation
CAM Steenbergen External organisation
AH de Vreede External organisation
MK Smit External organisation
TLM Scholtes External organisation
FH Groen ImPhys/Optics - AS
JW Pedersen External organisation
Research Group
ImPhys/Optics (AS) (TU Delft)
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Published Date

1996

Language

Undefined/Unknown

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Faculty

Applied Sciences

Department

ImPhys/Imaging Physics

Research Group

ImPhys/Optics