Plasma-enhanced chemical vapor deposition of thick silicon nitride films with low stress on inP.
Journal Article
(1996)
Author(s)
L. Shi (External organisation)
CAM Steenbergen (External organisation)
AH de Vreede (External organisation)
MK Smit (External organisation)
TLM Scholtes (External organisation)
FH Groen (TU Delft - ImPhys/Optics)
JW Pedersen (External organisation)
Research Group
ImPhys/Optics
To reference this document use:
https://resolver.tudelft.nl/uuid:7d38e61d-297a-463d-b946-f8de1b9b2a8a
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Publication Year
1996
Research Group
ImPhys/Optics
Volume number
14
Pages (from-to)
471-473
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