Plasmonic enhancement of photoacoustic-induced reflection changes
Guido De Haan (Advanced Research Center for Nanolithography, Amsterdam, Universiteit van Amsterdam)
Vanessa Verrina (Universiteit van Amsterdam, Advanced Research Center for Nanolithography, Amsterdam)
Aurèle J L Adam (TU Delft - ImPhys/Optics)
Hao Zhang (Advanced Research Center for Nanolithography, Amsterdam)
Paul C.M. Planken (Advanced Research Center for Nanolithography, Amsterdam, Universiteit van Amsterdam)
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Abstract
In this paper, we report on surface-plasmon-resonance enhancement of the time-dependent reflection changes caused by laser-induced acoustic waves.We measure an enhancement of the reflection changes induced by several acoustical modes, such as longitudinal, quasi-normal, and surface acoustic waves, by a factor of 10-20.We show that the reflection changes induced by the longitudinal and quasi-normal modes are enhanced in the wings of the surface plasmon polariton resonance. The surface acoustic wave-induced reflection changes are enhanced on the peak of this resonance.We attribute the enhanced reflection changes to the longitudinal wave and the quasi-normal mode to a shift in the surface plasmon polariton resonance via acoustically induced electron density changes and via grating geometry changes.