Deep anisotropic dry etching of silicon microstructures by high-density plasmas
Doctoral Thesis
(2004)
Authors
MA Blauw (TU Delft - QN/Kavli Nanolab Delft)
Research Group
QN/Kavli Nanolab Delft
To reference this document use:
https://resolver.tudelft.nl/839a50e4-29a9-490f-950a-32b3a2ca9da7
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Publication Year
2004
Research Group
QN/Kavli Nanolab Delft
ISBN (print)
90-901 7644-6
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