Combining UV-and Electron beam lithography for superconducting bandpass filters in mm/sub-mm astronomy

Conference Paper (2020)
Author(s)

David J. Thoen (TU Delft - Tera-Hertz Sensing)

Vignesh Murugesan (Student TU Delft)

Kenichi Karatsu (TU Delft - Tera-Hertz Sensing)

A. Pascual Pascual Laguna (TU Delft - Tera-Hertz Sensing)

Akira Endo (TU Delft - Tera-Hertz Sensing)

J. Baselmans (TU Delft - Tera-Hertz Sensing)

Research Group
Tera-Hertz Sensing
DOI related publication
https://doi.org/10.1117/12.2561452
More Info
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Publication Year
2020
Language
English
Research Group
Tera-Hertz Sensing
Volume number
11453

Abstract

Microfabrication of on-chip filterbanks, such as DESHIMA 2.0, would greatly benefit from reliable fabrication with sub-micrometer resolution. This enables smaller devices and reduces scatter in parameters such as filter bandwidth and resonant frequency. Here we present “mix-and-match” processing by combining optical and electron-beam exposures of a single layer of negative ma-N1405 resist from Micro-Resist-Technology GmbH. This allows for minimal features down to 300 nm where needed and large structure exposure with UV, limiting e-beam writing time. Relative alignment is possible to less than 500 nm on a regular basis.

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