Limiting Factors for electron beam lithography when using ultra-thin HSQ layers
Journal Article
(2007)
Author(s)
AE Grigorescu (TU Delft - ImPhys/Charged Particle Optics)
M.C. van der Krogt (TU Delft - QN/Kavli Nanolab Delft)
Kees Hagen (TU Delft - ImPhys/Charged Particle Optics)
Research Group
ImPhys/Charged Particle Optics
To reference this document use:
https://resolver.tudelft.nl/uuid:891c6b6d-5aef-4931-8d7c-a8da92c12e2c
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Publication Year
2007
Research Group
ImPhys/Charged Particle Optics
Issue number
4
Volume number
6
Pages (from-to)
3006-3012
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