Effect of post-deposition treatments on the hydrogenation of hot-wire deposited amorphous silicon films.
Journal Article
(1999)
Author(s)
KF Feenstra (External organisation)
PFA Alkemade (TU Delft - Old - sect Electronic Materials (NS/EM))
E Algra (External organisation)
REI Schropp (External organisation)
W.F. van der Weg (External organisation)
Research Group
Old - sect Electronic Materials (NS/EM)
To reference this document use:
https://resolver.tudelft.nl/uuid:8a33df04-527d-4518-a431-684ae1942cdb
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Publication Year
1999
Research Group
Old - sect Electronic Materials (NS/EM)
Volume number
7
Pages (from-to)
341-351
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