A silicon MEMS structure for characterization of femto-farad-level capacitive sensors with lock-in architecture
Journal Article
(2010)
Author(s)
J Wei (TU Delft - Electronic Components, Technology and Materials)
C Yue (External organisation)
ZL Chen (External organisation)
ZW Liu (External organisation)
Pasqualina M. Sarro (TU Delft - Electronic Components, Technology and Materials)
Research Group
Electronic Components, Technology and Materials
DOI related publication
https://doi.org/10.1088/0960-1317/20/6/064019
To reference this document use:
https://resolver.tudelft.nl/uuid:8cc71f38-ef95-4b31-930f-5a8c14e7e732
More Info
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Publication Year
2010
Language
English
Research Group
Electronic Components, Technology and Materials
Issue number
6
Volume number
20
Pages (from-to)
1-8
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