Antireflective subwavelength patterning of IR optics

Abstract

Thermal infrared (IR) lenses require efficient anti-reflection coating. Moth-eye (or egg-box) 2D subwavelength gratings have demonstrated their ability to reach a very high transmission for a wide wavelength and angular range. The use in thermal IR is simplified by the lower resolution for lithographic technology, compared to visible waveband. However, deeper structures must be engraved and lithography must be adapted to IR materials. In order to be cost-effective, the patterning must be produced by replication techniques, such as embossing. Our laboratory is now experimenting hot embossing of moth-eye patterns in chalcogenide substrates. In this paper, theoretical analysis, micro-lithographic technology and manufacturing processes are detailed.