Analysis of the fabrication process of Nb/Al-AlN/sub x//Nb tunnel junctions with low R/sub n/A values for SIS mixers
Journal Article
(2003)
Author(s)
N Iossad (TU Delft - QN/Fysics of NanoElectronics)
M Kroug (TU Delft - QN/Fysics of NanoElectronics)
T Zijlstra (TU Delft - QN/Fysics of NanoElectronics)
AB Ermakov (External organisation)
BD Jackson (TU Delft - QN/Fysics of NanoElectronics)
M.R. Zuiddam (TU Delft - QN/Kavli Nanolab Delft)
FE Meijer (TU Delft - QN/Fysics of NanoElectronics)
T.M. Klapwijk (TU Delft - QN/Fysics of NanoElectronics)
Research Group
QN/Fysics of NanoElectronics
To reference this document use:
https://resolver.tudelft.nl/uuid:8dbb2baf-73e8-4343-acff-4d18661d4536
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Publication Year
2003
Research Group
QN/Fysics of NanoElectronics
Issue number
2
Volume number
13
Pages (from-to)
127-130
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