Low loss EELS of Si/Ge devices: Si, Ge, SiO2 and HfO2
Report
(2003)
Author(s)
FD Tichelaar (TU Delft - QN/High Resolution Electron Microscopy)
S Lazar (TU Delft - OLD Virtual Materials and Mechanics)
GA Botton (TU Delft - OLD Virtual Materials and Mechanics)
Research Group
QN/High Resolution Electron Microscopy
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Publication Year
2003
Research Group
QN/High Resolution Electron Microscopy
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