Implementation of General Coupling Model of Electromigration in ANSYS
Zhen Cui (TU Delft - Electronic Components, Technology and Materials)
X.J. Fan (Lamar University)
Guo Qi Zhang (TU Delft - Electronic Components, Technology and Materials)
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Abstract
In this paper, a recently developed theory - general coupling model of electromigration, is implemented in ANSYS. We first identify several errors provided in ANSYS manual for electromigration modeling. Then the general coupling model is implemented in ANSYS and the detailed description is presented. Finally, a 1-D confined metal line with a perfectly blocking condition is presented as a benchmark problem, in which the finite element solutions are in excellent agreement with the analytical solutions.