Electron beam induced deposited etch masks
Journal Article
(2009)
Author(s)
CTH Heerkens (TU Delft - ImPhys/Charged Particle Optics)
M.J. Kamerbeek (TU Delft - Electronic Components, Technology and Materials)
WF van Dorp (TU Delft - ImPhys/Charged Particle Optics)
Kees C.W. Hagen (TU Delft - ImPhys/Charged Particle Optics)
J Hoekstra (TU Delft - Electronics)
Research Group
ImPhys/Charged Particle Optics
To reference this document use:
https://resolver.tudelft.nl/uuid:92cffb13-f372-4c08-aae4-f345d716e867
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Publication Year
2009
Research Group
ImPhys/Charged Particle Optics
Issue number
4-6
Volume number
86
Pages (from-to)
961-964
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