DUV-E-beam Mix and Match lithography in a single mask for fabricating a multi-terminal SQUID-device
Journal Article
(1996)
Author(s)
BJ Vleeming (External organisation)
JTLR Leene (External organisation)
EWJM van der Drift (TU Delft - QN/Kavli Nanolab Delft)
J Romijn (TU Delft - QN/Kavli Nanolab Delft)
Research Group
QN/Kavli Nanolab Delft
To reference this document use:
https://resolver.tudelft.nl/uuid:97988855-f265-41c2-8ee6-a56f688ba4b5
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Publication Year
1996
Research Group
QN/Kavli Nanolab Delft
Volume number
30
Pages (from-to)
81-84
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