DUV-E-beam Mix and Match lithography in a single mask for fabricating a multi-terminal SQUID-device

Journal Article (1996)
Author(s)

BJ Vleeming (External organisation)

JTLR Leene (External organisation)

EWJM van der Drift (TU Delft - QN/Kavli Nanolab Delft)

J Romijn (TU Delft - QN/Kavli Nanolab Delft)

Research Group
QN/Kavli Nanolab Delft
More Info
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Publication Year
1996
Research Group
QN/Kavli Nanolab Delft
Volume number
30
Pages (from-to)
81-84

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