Contact and alignment marker technology for atomic scale device fabrication

Zuiddam, M.R.; Rogge, S.; Geerlings, LJ; van der Drift, EWJM; Ilge, B; Palasantzas, G

Contact and alignment marker technology for atomic scale device fabrication

Journal article (1998)

Authors

M.R. Zuiddam QN/Kavli Nanolab Delft

S. Rogge QN/Fysics of NanoElectronics

LJ Geerlings External organisation

EWJM van der Drift QN/Kavli Nanolab Delft

B Ilge QN/Fysics of NanoElectronics

G Palasantzas Old organisation TN/TechnischeNatuurkunde voorm

Research Group

QN/Kavli Nanolab Delft

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Published Date

1998

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Research Group

QN/Kavli Nanolab Delft

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