Contact and alignment marker technology for atomic scale device fabrication

Journal article (1998)

Authors

M.R. Zuiddam QN/Kavli Nanolab Delft - AS
S. Rogge QN/Fysics of NanoElectronics
LJ Geerlings External organisation
E.W.J.M. van der Drift QN/Kavli Nanolab Delft - AS
B Ilge QN/Fysics of NanoElectronics
G Palasantzas Old organisation TN/TechnischeNatuurkunde voorm
Research Group
QN/Kavli Nanolab Delft (AS) (TU Delft)
More Info
expand_more

Published Date

1998

Language

Undefined/Unknown

Reuse Rights

Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.

Faculty

Applied Sciences

Department

QN/Quantum Nanoscience

Research Group

QN/Kavli Nanolab Delft