Impact of pixel-dose optimization on pattern fidelity for helium ion beam lithography on EUV resist
Conference Paper
(2015)
Author(s)
N Kalhor (External organisation)
W Mulckhuyse (External organisation)
PFA Alkemade (TU Delft - QN/Kavli Nanolab Delft)
D Maas (External organisation)
Research Group
QN/Kavli Nanolab Delft
DOI related publication
https://doi.org/10.1117/12.2085791
To reference this document use:
https://resolver.tudelft.nl/uuid:a52dc4ba-531e-4713-af99-9dd29742b247
More Info
expand_more
expand_more
Publication Year
2015
Language
English
Research Group
QN/Kavli Nanolab Delft
Pages (from-to)
1-9
ISBN (print)
9781628415278
No files available
Metadata only record. There are no files for this record.