Impact of pixel-dose optimization on pattern fidelity for helium ion beam lithography on EUV resist

Conference Paper (2015)
Author(s)

N Kalhor (External organisation)

W Mulckhuyse (External organisation)

PFA Alkemade (TU Delft - QN/Kavli Nanolab Delft)

D Maas (External organisation)

Research Group
QN/Kavli Nanolab Delft
DOI related publication
https://doi.org/10.1117/12.2085791
More Info
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Publication Year
2015
Language
English
Research Group
QN/Kavli Nanolab Delft
Pages (from-to)
1-9
ISBN (print)
9781628415278

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