Impact of pixel-dose optimization on pattern fidelity for helium ion beam lithography on EUV resist

Conference paper (2015)

Authors

N Kalhor External organisation
W Mulckhuyse External organisation
P.F.A. Alkemade QN/Kavli Nanolab Delft - AS
D Maas External organisation
Research Group
QN/Kavli Nanolab Delft (AS) (TU Delft)
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Published Date

2015

Language

English

Reuse Rights

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Faculty

Applied Sciences

Department

QN/Quantum Nanoscience

Research Group

QN/Kavli Nanolab Delft