Study of inverse Ni-based photonic crystal using the microradian X-ray diffraction
A. V. Vasilieva (Petersburg Nuclear Physics Institute (PNPI))
N. A. Grigoryeva (St. Petersburg State University)
A. A. Mistonov (St. Petersburg State University)
N. A. Sapoletova (Chemistry Faculty of M. V. Lomonosov Moscow State University)
K. S. Napolskii (Chemistry Faculty of M. V. Lomonosov Moscow State University)
A. A. Eliseev (Chemistry Faculty of M. V. Lomonosov Moscow State University)
A. V. Lukashin (Chemistry Faculty of M. V. Lomonosov Moscow State University)
Yu D. Tretyakov (Chemistry Faculty of M. V. Lomonosov Moscow State University)
W. G. Bouwman (TU Delft - RST/Neutron and Photon Methods for Materials)
undefined More Authors (External organisation)
More Info
expand_more
Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.
Abstract
Inverse photonic nickel-based crystal films formed by electrocrystallization of metal inside the voids of polymer artificial opal have been studied using the microradian X-ray diffraction. Analysis of the diffraction images agrees with an face-centred cubic (FCC) structure with the lattice constant a0 650 10 nm and indicates two types of stacking sequences coexisting in the crystal (twins of ABCABC... and ACBACB... ordering motifs), the ratio between them being 4:5 The transverse structural correlation length Ltran is 2.4 0.1 μm, which corresponds to a sample thickness of 6 layers. The in-plane structural correlation length L long is 3.4 0.2 μm, and the structure mosaic is of order of 10°.