EUV mask feature reconstruction via phase retrieval
P. Ansuinelli (TU Delft - ImPhys/Optics)
W.M.J.M. Coene (TU Delft - ImPhys/Optics, ASML)
H. P. Urbach (TU Delft - ImPhys/Optics)
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Abstract
EUV lithography is the main candidate for patterning of future technology nodes. Its successful implementation depends on many aspects, among which the availability of actinic mask metrology tools able to inspect the patterned absorber in order to control and monitor the lithographic process. In this work, we perform a simulation study to assess the performance of coherent diffractive imaging (CDI) and related phase retrieval methods for the reconstruction of non-Trivially shaped and a-periodic nanostructures from far field intensity data.