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W.M.J.M. Coene

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24 records found

Journal article (2026) - Frank Van der Ceelen, Yifeng Shao, Wim Coene
Rigorous Coupled-Wave Analysis (RCWA) is a semi-analytical method, used to determine the optical response of nanostructures, such as meta-materials. Recently, the ability to combine RCWA with automatic differentiation for optical response optimization has been demonstrated. We seek to build upon this use by attempting to address RCWA’s poor performance on parallel computer architecture, stemming from the presence of an eigendecomposition. We do this by outlining an alteration of RCWA, which replaces the eigendecomposition with a matrix square root and matrix exponential evaluation. Furthermore, we demonstrate that these matrix functions can be evaluated using algorithms which are both differentiable and readily evaluated in parallel. Finally, we show that replacing the eigendecomposition with these matrix functions resolves the bottleneck and paves the way for higher-accuracy parameter retrieval using RCWA approaching real-time performance, without compromising stability. ...

A survey of selected open problems in phase retrieval

Journal article (2025) - Marc Allain, Selin Aslan, Wim Coene, Sjoerd Dirksen, Jonathan Dong, Julien Flamant, Mark Iwen, Felix Krahmer, Tristan van Leeuwen, More authors...
Phase retrieval is an inverse problem that, on one hand, is crucial in many applications across imaging and physics, and, on the other hand, leads to deep research questions in theoretical signal processing and applied harmonic analysis. This survey paper is an outcome of the recent workshop Phase Retrieval in Mathematics and Applications (PRiMA) (held on August 5–9 2024 at the Lorentz Center in Leiden, The Netherlands) that brought together experts working on theoretical and practical aspects of the phase retrieval problem with the purpose to formulate and explore essential open problems in the field. ...
Journal article (2025) - Sven Weerdenburg, Roland Horsten, Wim Coene
We demonstrate the implementation of a compact schlieren imaging technique for quantitatively measuring atomic density profiles in a gas jet-based high harmonic generation EUV source. This technique compares high harmonic generation light sources and optimization, considering different nozzle geometries, backing pressures, and vacuum systems. The simplicity of schlieren imaging could make it a suitable standardized inspection tool for gas jet-based high harmonic generation sources. Several gas jet profiles at different backing pressures were analyzed, enabling the retrieval of the peak pressure within the gas jet and the impact of the vacuum system on the jets' shape. ...
Conference paper (2024) - Sander Senhorst, Yifeng Shao, Sven Weerdenburg, Roland Horsten, Christina Porter, Wim Coene
Ptychography as a means of lensless imaging is used in wafer metrology applications using Extreme Ultraviolet (EUV) light, where use of high quality optics is out-of-scope. To obtain sufficient diffraction intensity, reflection geometries with shallow (ca. 20 degrees) grazing incidence angles are used, which require re-sampling the diffraction data in a process called tilted plane correction (TPC). The tilt angle used for TPC is conventionally obtained through either experimentally tricky calibration, manual estimation based on diffraction pattern symmetry, although computational approaches are emerging. In this work we offer an improved numerical optimization approach as an alternative to TPC, where we use the flexibility offered by our Automatic Differentiation (AD)-based ptychography approach to include the data resampling into the forward model to learn the tilt angle. We demonstrate convergence of the approach across a range of incidence angles on simulated and experimental data obtained on an EUV beamline with either a high-harmonic generation (HHG)-based or a visible light source. ...
Conference paper (2024) - Wim Coene, Yifeng Shao, Sven Weerdenburg, Sander Senhorst, Roland Horsten, H. Paul Urbach, Jacob Seifert, Allard P. Mosk
Next-generation metrology solutions in various technology areas require to image sample areas at the nanoscale. Coherent diffractive imaging based on ptychography is the route towards EUV imaging of nanostructures without lenses. A key component in a table-top EUV beamline is a high-brightness high-harmonic generation (HHG) source. Since our research is mainly directed towards wafer metrology for lithography in the semiconductor industry, we adhere to a reflection setup: the EUV light is scattered by the nanostructures at the surface of the sample, and is reflected towards a CCD camera, where a far-field diffraction pattern is recorded. A data-set comprising a multitude of these diffraction patterns is generated for partially overlapping positions of the focused probe on the sample. This provides the necessary redundancy for phase retrieval of the complex-valued field of the sample. Recent advancements in both hardware and software for computation enable the development of advanced algorithms. In particular, the benefits of automatic differentiation are exploited in order to cope with a drastic growth in model complexity. Our computational imaging algorithms realize wavelengthmultiplexed reconstruction and a modal approach for the spatial coherence of the source. ...
Journal article (2024) - Sander Senhorst, Yifeng Shao, Sven Weerdenburg, Roland Horsten, Christina Porter, Wim Coene
Ptychography in a reflection geometry shows great promise for non-destructive imaging of 3-dimensional nanostructures at the surface of a thick substrate. A major challenge to obtain high quality reflection-ptychographic images under near-grazing conditions has been to calibrate the incidence angle used to straighten the measured curved diffraction patterns in a process referred to as ‘tilted plane correction’ (TPC). In this work, we leverage the flexibility of automatic differentiation (AD)-based modeling to realize an alternative approach, where the tilted propagation is included in the forward model. Use of AD allows us to jointly optimize the tilt angles with the typical probe and object, eliminating the need for accurate calibration or random search optimization. The approach was validated using datasets generated with an extreme ultraviolet (EUV) beamline based on both a tabletop high harmonic generation (HHG) source and a visible laser. We demonstrate that the proposed approach can converge to a precision of ±0.05◦ for probe beams at 70◦ angle of incidence, possibly precise enough for use as a calibration approach. Furthermore, we demonstrate that optimizing for the tilt angles reduces artifacts and increases reconstruction fidelity. Use of AD not only streamlines the current ptychographic reconstruction process, but should also enable optimization of more complex models in other domains, which will likely be useful for future advancements in computational imaging. ...
Journal article (2024) - Yifeng Shao, Sven Weerdenburg, Jacob Seifert, H. Paul Urbach, Allard P. Mosk, Wim Coene
Ptychographic extreme ultraviolet (EUV) diffractive imaging has emerged as a promising candidate for the next generationmetrology solutions in the semiconductor industry, as it can image wafer samples in reflection geometry at the nanoscale. This technique has surged attention recently, owing to the significant progress in high-harmonic generation (HHG) EUV sources and advancements in both hardware and software for computation. In this study, a novel algorithm is introduced and tested, which enables wavelength-multiplexed reconstruction that enhances the measurement throughput and introduces data diversity, allowing the accurate characterisation of sample structures. To tackle the inherent instabilities of the HHG source, a modal approach was adopted, which represents the cross-density function of the illumination by a series of mutually incoherent and independent spatial modes. The proposed algorithm was implemented on a mainstream machine learning platform, which leverages automatic differentiation to manage the drastic growth in model complexity and expedites the computation using GPU acceleration. By optimising over 200 million parameters, we demonstrate the algorithm's capacity to accommodate experimental uncertainties and achieve a resolution approaching the diffraction limit in reflection geometry. The reconstruction of wafer samples with 20-nm high patterned gold structures on a silicon substrate highlights our ability to handle complex physical interrelations involving a multitude of parameters. These results establish ptychography as an efficient and accurate metrology tool. ...
Conference paper (2022) - Sven Weerdenburg, Yifeng Shao, Jacob Seifert, Roland Horsten, Wim Coene
We demonstrate our beamline using a table-top HHG EUV source for lensless imaging application in reflection m ode. T he s ample r eflection fu nction is reconstructed using an auto-differentiation based ptychographic algorithm built on TensorFlow platform. ...
Conference paper (2022) - Maxim Tschernajew, Steffen Hädrich, Robert Klas, Martin Gebhardt, Roland Horsten, Sven Weerdenburg, Sergey Pyatchenkov, Wim Coene, Sven Breitkopf, More Authors...
We present a highly stable, easy-to-use HHG source delivering a record photon flux of >1011 photons/s at 69eV-75eV, being tunable to approx. 100eV which will be used for future photon-hungry applications. ...
Conference paper (2021) - Maxim Tschernajew, Steffen Hadrich, Robert Klas, Martin Gebhardt, Roland Horsten, Sven Werdenburg, Sergey Pyatchenkov, Wim Coene, Jan Rothhardt, More Authors...
High-harmonic generation (HHG) driven by ultrashort laser pulses is an established process for the generation of coherent extreme ultraviolet (XUV) to soft X-ray radiation, which has found widespread use in various applications [1]. In recent years photon-hungry applications such as coherent diffractive imaging [2] , [3] and applications based on statistical analysis [3] have required more powerful HHG sources, in particular, at high repetition rates. This need can be addressed by using high average power fiber lasers as the HHG drivers [4]. Here, we present a HHG-based XUV source, capable of providing a large photon flux across a wide range between 66 eV and 150 eV. It is driven by a commercial XUV beamline from Active Fiber Systems GmbH consisting of 100-W average power fiber-laser system, delivering up to 300J at <300-fs pulse duration. For HHG this system is operated at 100 W, 600 kHz. A post-compression unit is part of the device to shorten the pulses to ~35 fs, the average power remains at 63W. The turnkey source can provide unprecedented photon fluxes of >10 11 photons/s in each harmonic between 69 eV and 75 eV (HH57-HH63). All fluxes are given at the generation point, i.e. directly after the source. ...
Journal article (2021) - Xukang Wei, H. Paul Urbach, Peter van der Walle, Wim M.J. Coene
We present a parameter retrieval method which incorporates prior knowledge about the object into ptychography. The proposed method is applied to two applications: (1) parameter retrieval of small particles from Fourier ptychographic dark field measurements; (2) parameter retrieval of a rectangular structure with real-space ptychography. The influence of Poisson noise is discussed in the second part of the paper. The Cramér Rao Lower Bound in both applications is computed and Monte Carlo analysis is used to verify the calculated lower bound. With the computation results we report the lower bound for various noise levels and analyze the correlation of particles in application 1. For application 2 the correlation of parameters of the rectangular structure is discussed. ...
Journal article (2020) - A. P. Konijnenberg, A. C.C. De Beurs, G. S.M. Jansen, H. P. Urbach, S. Witte, W. M.J. Coene
Diffractive shearing interferometry (DSI) is a method that has recently been developed to perform lensless imaging using extreme ultraviolet radiation generated by high-harmonic generation. In this paper, we investigate the uniqueness of the DSI solution and the requirements for the support constraint size. We find that there can be multiple solutions to the DSI problem that consist of displaced copies of the actual object. These alternative solutions can be eliminated by enforcing a sufficiently tight support constraint, or by introducing additional synthetic constraints. We furthermore propose a new DSI algorithm inspired by the analogy with coherent diffractive imaging (CDI) algorithms: the original DSI algorithm is in a way analogous to the hybrid input-output algorithm as used in CDI, and we propose a new algorithm that is more analogous to the error reduction algorithm as used in CDI. We find that the newly proposed algorithm is suitable for final refinement of the reconstruction. ...
Journal article (2020) - P. Ansuinelli, W.M.J.M. Coene, Paul Urbach
The development of actinic mask metrology tools represents one of the major challenges to be addressed on the roadmap of extreme ultra violet (EUV) lithography. Technological advancements in EUV lithography result in the possibility to print increasingly fine and highly resolved structures on a silicon wafer, however the presence of fine–scale defects, interspersed in the printable mask layout, may lead to defective wafer prints. Hence the development of
actinic methods for review of potential defect sites becomes paramount. Here, we report on a ptychographic algorithm that makes use of prior information about the object to be retrieved, generated by means of rigorous computations, to improve the detectability of defects whose dimensions are of the order of the wavelength. The comprehensive study demonstrates that the inclusion of prior information as a regularizer in the ptychographic optimization problem
results in a higher reconstruction quality and an improved robustness to noise with respect to the standard ptychographic iterative engine (PIE). We show that the proposed method decreases the number of scan positions necessary to retrieve an high quality image and relaxes requirements in terms of signal to noise ratio (SNR). The results are further compared with the state–of–art total
variation based ptychographic imaging ...
Journal article (2020) - Xukang Wei, H. Paul Urbach, Wim M.J. Coene
We investigate the performance of ptychography with noisy data by analyzing the Cramér-Rao lower bound. The lower bound of ptychography is derived and numerically computed for both top-hat plane wave and structured illumination. The influence of Poisson noise on the ptychography reconstruction is discussed. The computation result shows that, if the estimator is unbiased, the minimum variance for Poisson noise is mostly determined by the illumination power and the transmission function of the object. Monte Carlo analysis is conducted to validate our calculation results for different photon flux numbers. Furthermore, the performance of the maximum-likelihood method and the approach of amplitude-based cost-function minimization is studied in the Monte Carlo analysis. ...
Journal article (2020) - A. C.C. de Beurs, X. Liu, G. S.M. Jansen, A. P. Konijnenberg, W. M.J. Coene, K. S.E. Eikema, S. Witte
We report on a method that allows microscopic image reconstruction from extreme-ultraviolet diffraction patterns without the need for object support constraints or other prior knowledge about the object structure. This is achieved by introducing additional diversity through rotation of an object in a rotationally asymmetric probe beam, produced by the spatial interference between two phase-coherent high-harmonic beams. With this rotational diffractive shearing interferometry method, we demonstrate robust image reconstruction of microscopic objects at wavelengths around 30 nm, using images recorded at only three to five different object rotations. ...
Conference paper (2020) - Paolo Ansuinelli, Wim M. Coene, H. P. Urbach
The imaging and inspection of extreme ultraviolet (EUV) masks is an important aspect of EUV lithography. The availability of actinic mask inspection tools able to generate highly resolved defect maps of defective EUV layouts is needed to ensure defect-free wafer prints. The technological interest towards phase-shift absorber materials for the next generation of EUV masks, and the associated need for phase metrology at the absorber level, makes phase retrieval methods a particularly interesting option for actinic inspection. In this work we use ptychography as an inspection tool for EUV masks. We show how variational and statistical methods can be employed to include a-priori information in the ptychographic inverse problem and how to cluster different update rules - stemming from the minimization of appropriate cost functionals - to optimally include prior information in ptychography under Poisson noise. ...
Journal article (2019) - Paolo Ansuinelli, Wim M.J. Coene, H. P. Urbach
Scatterometry is an important nonimaging and noncontact method for optical metrology. In scatterometry certain parameters of interest are determined by solving an inverse problem. This is done by minimizing a cost functional that quantifies the discrepancy among measured data and model evaluation. Solving the inverse problem is mathematically challenging owing to the instability of the inversion and to the presence of several local minima that are caused by correlation among parameters. This is a relevant issue, particularly when the inverse problem to be solved requires the retrieval of a high number of parameters. In such cases, methods to reduce the complexity of the problem are to be sought. In this work, we propose an algorithm suitable to automatically determine which subset of the parameters is mostly relevant in the model, and we apply it to the reconstruction of 2D and 3D scatterers. We compare the results with local sensitivity analysis and with the screening method proposed by Morris. ...
Conference paper (2019) - Paolo Ansuinelli, Wim Coene, Paul Urbach
EUV lithography is the main candidate for patterning of future technology nodes. Its successful implementation depends on many aspects, among which the availability of actinic mask metrology tools able to inspect the patterned absorber in order to control and monitor the lithographic process. In this work, we perform a simulation study to assess the performance of coherent diffractive imaging (CDI) and related phase retrieval methods for the reconstruction of non-Trivially shaped and a-periodic nanostructures from far field intensity data. ...
Journal article (2018) - Sander Konijnenberg, Xingyuan Lu, Leixin Liu, Wim Coene, Chengliang Zhao, Paul Urbach
A novel non-iterative phase retrieval method is proposed and demonstrated with a
proof-of-principle experiment. The method uses a fixed specially designed mask and through-focus intensity measurements. It is demonstrated that this method is robust to spatial partial coherence in the illumination, making it suitable for coherent diffractive imaging using spatially partially coherent light, as well as for coherence characterization. ...
Journal article (2018) - A. P. Konijnenberg, W. M.J. Coene, H. P. Urbach
A noise-robust extension of iterative phase retrieval algorithms that does not need to assume a noise model is proposed. It works by adapting the intensity constraints using the reconstructed object. Using a proof-of-principle ptychographic experiment with visible light and a spatial light modulator to create an object, the proposed method is tested and it compares favorably to the Extended Ptychographic Iterative Engine (ePIE) with reduced step size. The method is general, so it can also be applied to other iterative reconstruction schemes such as phase retrieval using focus variation. ...