Analysis and Modeling of Spill Back Effect in High Illumination CMOS Image Sensors

Journal Article (2020)
Author(s)

Jiangtao Xu (Tianjin University)

Ruishuo Wang (Tianjin University)

L. Han (TU Delft - Electronic Instrumentation)

Zhiyuan Gao (Guangdong University of Technology)

Research Group
Electronic Instrumentation
DOI related publication
https://doi.org/10.1109/JSEN.2019.2956594
More Info
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Publication Year
2020
Language
English
Research Group
Electronic Instrumentation
Issue number
6
Volume number
20
Pages (from-to)
3024-3031

Abstract

To improve charge transfer efficiency (CTE) and eliminate image lag, the impact of spill back effect on image lag is studied in CMOS image sensors (CISs), particularly in high illumination condition. By establishing a mathematical model based on the thermionic emission and drift-diffusion theory, the physical mechanism of spill back effect is described. This model shows that a lower transfer gate (TG) operating voltage and a higher reset voltage of Floating Diffusion (FD) node would mitigate spill back effect. In a 0.18 μ m CMOS process, by setting that the gate voltage of transfer transistor and the reset voltage of FD is 2.8 V and 3.8 V respectively, CTE of the proposed pixel is increased to 100%. The theoretical analysis and TCAD simulation results can explain spill back effect and offer a reference for designing a high CTE pixel in high illumination CISs.

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