Ultrahigh resolution focused electron beam induces processing: the effect of substrate thickness
Journal Article
(2011)
Author(s)
W.F. van Dorp (TU Delft - ImPhys/Charged Particle Optics)
I. Lazic (TU Delft - ImPhys/Charged Particle Optics)
A Beyer (External organisation)
A Golzhauser (External organisation)
JB Wagner (External organisation)
TW Hansen (External organisation)
Kees Hagen (TU Delft - ImPhys/Charged Particle Optics)
Research Group
ImPhys/Charged Particle Optics
To reference this document use:
https://resolver.tudelft.nl/uuid:c4587f54-e518-49a5-bbcd-23534ef401d4
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Publication Year
2011
Research Group
ImPhys/Charged Particle Optics
Issue number
115303
Volume number
22
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