Roughness treatment of silicon surface after Deep Reactive Ion Etching

Conference paper (2007)

Authors

HTM Pham Electronic Components, Technology and Materials - EEMCS
C.R. de Boer Electronic Components, Technology and Materials - EEMCS
Pasqualina M Sarro Electronic Components, Technology and Materials - EEMCS
Research Group
Electronic Components, Technology and Materials (EEMCS) (TU Delft)
Elektrotechniek Techniek
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Published Date

2007

Language

Undefined/Unknown

Reuse Rights

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Components, Technology and Materials