X-ray photoelectron spectroscopy studies of the effects of plasma etching on amorphous carbon nitride films
Journal Article
(2002)
Author(s)
L. Jiang (External organisation)
AG Fitzgerald (External organisation)
MJ Rose (External organisation)
R Cheung (External organisation)
B Rong (External organisation)
Emile van der Drift (TU Delft - QN/Kavli Nanolab Delft)
Research Group
QN/Kavli Nanolab Delft
To reference this document use:
https://resolver.tudelft.nl/uuid:ca619225-3e0a-4820-9c79-0cefc0ba8465
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Publication Year
2002
Research Group
QN/Kavli Nanolab Delft
Volume number
193
Pages (from-to)
144-148
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