Etch mechanism and etch-induced effects in the inductively coupled plasma etching of GaN
Journal Article
(2003)
Author(s)
R Cheung (External organisation)
B Rong (TU Delft - Old - EWI Ch. Integrated Sensing Devices)
Emile van der Drift (TU Delft - QN/Kavli Nanolab Delft)
W.G. Sloof (TU Delft - OLD Virtual Materials and Mechanics)
Research Group
Old - EWI Ch. Integrated Sensing Devices
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Publication Year
2003
Research Group
Old - EWI Ch. Integrated Sensing Devices
Issue number
4
Volume number
21
Pages (from-to)
1268-1272
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