Fabrication process of Si microlenses for OCT systems

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Fabrication process of Si microlenses for OCT systems

Conference Paper (2016)

Author(s)

A. Jovic (TU Delft - Electronic Components, Technology and Materials)

Gregory Pandraud (TU Delft - EKL Processing)

Kirill Zinoviev (MedLumics)

Jose L. Rubio (MedLumics)

E Margallo (MedLumics)

Pasqualina M Sarro (TU Delft - Electronic Components, Technology and Materials)

Research Group

Electronic Components, Technology and Materials

DOI related publication

https://doi.org/10.1117/12.2227898

Fabrication Si microlenses Thermal photoresist reflow

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https://resolver.tudelft.nl/uuid:cec4bee5-efb8-43ec-bb41-0726f23b8d5f

More Info

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Publication Year

2016

Language

English

Research Group

Electronic Components, Technology and Materials

Pages (from-to)

98880C-1/98888C-10

ISBN (electronic)

9781510601338

Abstract

We present Si microlenses fabricated using dry ICP plasma etching of silicon and thermal photoresist reflow. The process is insensitive to thermal reflow time and it can be easily incorporated into fabrication flows for complex optical systems. Using this process, we were able to fabricate microlenses with diameter of 150 μm, radius of curvature of 682 μm and with a surface roughness of only 25 nm.

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