Fabrication process of Si microlenses for OCT systems

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Fabrication process of Si microlenses for OCT systems

Conference Paper (2016)

Author(s)

A. Jovic (TU Delft - Electrical Engineering, Mathematics and Computer Science)

G. Pandraud (TU Delft - Electrical Engineering, Mathematics and Computer Science)

Kirill Zinoviev (MedLumics)

Jose L. Rubio (MedLumics)

E Margallo (MedLumics)

Lina Sarro (TU Delft - Electrical Engineering, Mathematics and Computer Science)

Research Group

Electronic Components, Technology and Materials

Fabrication Si microlenses Thermal photoresist reflow

DOI related publication

https://doi.org/10.1117/12.2227898 Final published version

To reference this document use

https://resolver.tudelft.nl/uuid:cec4bee5-efb8-43ec-bb41-0726f23b8d5f

More Info

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Publication Year

2016

Language

English

Research Group

Electronic Components, Technology and Materials

Article number

98880C

Pages (from-to)

98880C-1/98888C-10

ISBN (electronic)

9781510601338

Event

Micro-Optics 2016 (2016-04-03 - 2016-04-03), Brussels, Belgium

Downloads counter

206

Abstract

We present Si microlenses fabricated using dry ICP plasma etching of silicon and thermal photoresist reflow. The process is insensitive to thermal reflow time and it can be easily incorporated into fabrication flows for complex optical systems. Using this process, we were able to fabricate microlenses with diameter of 150 μm, radius of curvature of 682 μm and with a surface roughness of only 25 nm.