3D Volumetric Energy Deposition of Focused Helium Ion Beam Lithography

Visualization, Modeling, and Applications in Nanofabrication

Journal Article (2018)
Author(s)

Jingxuan Cai (Georgia Institute of Technology, The University of Hong Kong, Shenzhen University)

Zhouyang Zhu (Shenzhen University, The University of Hong Kong)

PFA Alkemade (TU Delft - QN/Kavli Nanolab Delft, Kavli institute of nanoscience Delft)

Emile van Veldhoven (TNO)

Qianjin Wang (Nanjing University)

Haixiong Ge (Nanjing University)

Sean P. Rodrigues (Georgia Institute of Technology)

Wenshan Cai (Georgia Institute of Technology)

W. Li (Shenzhen University, The University of Hong Kong)

Research Group
QN/Kavli Nanolab Delft
DOI related publication
https://doi.org/10.1002/admi.201800203
More Info
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Publication Year
2018
Language
English
Research Group
QN/Kavli Nanolab Delft
Issue number
12
Volume number
5

Abstract

In this paper, 3D volumetric energy deposition and local crosslinking of hydrogen silsesquioxane (HSQ) are experimentally and numerically explored in focused helium ion beam lithography (HIBL). In particular, a through-membrane exposure method is developed to make visible and subsequently to measure the 3D interaction volume and energy deposition of helium ions in HSQ. By comparing the actual dimensions of the crosslinked HSQ structures with Monte Carlo modeling of the spatial distribution of the energy deposition, the critical energy density for crosslinking HSQ is obtained. Finally, 3D nanofabrication of complex crosslinked HSQ nanostructures such as embedded nanochannels and suspended grids is demonstrated using two different exposure configurations. The proposed method expands the 2D point spread function of HIBL into three dimensions, thus opening a new avenue for nanoscale 3D fabrication.

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