Electrical Characterization of Residual Bulk Defects after Laser Annealing of Implanted Shallow Junctions
Conference Paper
(2006)
Author(s)
Shizhuo Liu (External organisation)
V Gonda (TU Delft - Electronic Components, Technology and Materials)
T.L.M. Scholtes (TU Delft - Electronic Components, Technology and Materials)
L.K. Nanver (TU Delft - Electronic Components, Technology and Materials)
Research Group
Electronic Components, Technology and Materials
To reference this document use:
https://resolver.tudelft.nl/uuid:d1c30225-19a7-48ee-a97f-53b074847652
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Publication Year
2006
Research Group
Electronic Components, Technology and Materials
Pages (from-to)
112-115
ISBN (print)
1-4244-0047-3
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